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ABOUT THE BOOK

Since its invention, the integrated circuit has necessitated new process modules and numerous architectural changes to improve application performances, power consumption, and cost reduction. Silicon CMOS is now well established to offer the integration of several tens of billions of devices on a chip or in a system. At present, there are important challenges in the introduction of heterogeneous co-integration of materials and devices with the silicon CMOS 2D- and 3D-based platforms. New fabrication techniques allowing strong energy and variability efficiency come in as possible players to improve the various figures of merit of fabrication technology.

Integrated Nanodevice and Nanosystem Fabrication: Breakthroughs and Alternatives is the second volume in the Pan Stanford Series on Intelligent Nanosystems. The book contains 8 chapters and is divided into two parts, the first of which reports breakthrough materials and techniques such as single ion implantation in silicon and diamond, graphene and 2D materials, nanofabrication using scanning probe microscopes, while the second tackles the scaling and architectural aspects of silicon devices through HiK scaling for nano CMOS, nano scale epitaxial growth of group IV semiconductors, design for variability co-optimization in SOI Fin FETs, and nano wires for CMOS and diversifications.

 TABLE OF CONTENTS

Introduction: Will new materials, fabrication and architecture schemes emerge for CMOS survival?

Simon Deleonibus

Deterministic single-ion implantation method for quantum processing in silicon and diamond

Takahiro Shinada , Enrico Prati, Takashi Tanii

Graphene and two-dimensional materials : extending silicon technology for the future?

Andreas Bablich, Satender Kataria, Vikram Passi, Max C. Lemme

Nanofabrication using scanning probe microscopes

V. Bouchiat

High-k dielectric scaling for nano CMOS technology

Hei Wong, Takamasa Kawanago, Kuniyuki Kakushima, Hiroshi Iwai

Nanometer scale epitaxial growth of group IV semiconductors

Junichi Murota

TCAD-based design technology co-optimization for variability in nanoscale SOI FinFETs

Xingsheng Wang, Vihar P. Georgiev, Fikru Adamu-Lema, Louis Gerrer, Salvatore M. Amoroso, Asen Asenov

Nanowires for CMOS and diversifications

Thomas Ernst, Sylvain Barraud